New SC 1500 ISO in-line deposition tool

The SC 1500 ISO In-line deposition tool is based on our standard SC 1500 modular system. Each chamber is isolated as a stand-alone process event with multiple gases, motion control and film depositions of your layered recipe selection. PVD, CVD, evaporation, heat or etching configuration options are available for each isolated
chamber.

MORE INFO:
Download PDF brochure

Specifications:

Target size: 5 x 15 (or customer specified type)

Capacity: 100mm = 224 per load
125mm = 168 per load
150mm = 112 per load
200mm = 56 per load
300mm = 28 per load

Deposition uniformities: Range from 1 to 5% on most metal films
Process types: DC or RF Magnetron sputtering
RF Etching
Ion Beam Deposition
Ion Beam Pre-clean
IR Heating
Resistive Evaporation
E-Beam Evaporation
CVD
Process Orientation: Horizontal or Vertical
Single or Dual Sided
Pumps: Cryo, Diffusion or Turbo

Other features: Residual Gas Analyzer vacuum performances analysis
Remote operation
Remote notification
On system video library

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