MRC 8667 System from SEMICORE

System is available in a fully operational and demonstrated condition at Semicore, Livermore, CA. Upgrades and modification may be quoted separately.

Configuration

Batch Sputter System. Three 8” diameter target assemblies, CTI-8 cryogenic pump with compressor, Leybold D30 mechanical pump, Automatic/ manual vacuum valve sequencer, Granville-Phillips 260 vacuum gauge controller. The tool is currently configured for RF sputtering with RF substrate etch. (DC capability optional) Excellent machine for R&D and/or pilot production.

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