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Reactive
Ion Etching Systems "RIE" are normally used for cleaning, descumming,
stripping resist and etching a multitude of materials (conductive and
dielectric). Side wall contours result in an anisotropic (vertical),
right angle bottom trench.
Key
Benefits
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Computer
operation guarantees identical process parameters from run to
run. |
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Data logging
for every automatic run (event driven). |
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Store
limitless number of recipes (.rcp files). |
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Chambers
available in Anodized Aluminum or Stainless Steel. |
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Water cooled
electrode, chamber and baseplate. |
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Aluminum
Oxide (ceramic) insulator. |
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Add purging
cycles if you wish. |
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+ or - 5%
uniformity guarantee. |
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Process
support available. |
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System
includes direct drive mechanical pump (14 cfm) with all
connecting fittings. |
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Choice of
high frequency (13.56 MHz) or low frequency (40 KHz) power
supplies. |
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Options: Down
Stream Pressure Control, Turbo Pumping, Scrubber, Oil
Filtration, Floor Model Cabinets and additional AFC's (Call for
pricing). |
Models:
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Description |
MODEL # |
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12" Al.
Chamber, w/2 AFC's , Low Freq. RF |
SC-RIE-A12-2-LF |
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12" Al.
Chamber, w/4 AFC's , Low Freq. RF |
SC-RIE-A12-4-LF |
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12" SS Chamber,
w/2 AFC's, Low Freq. RF |
SC-RIE-SS12-2-LF |
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12" SS Chamber,
w/4 AFC's , Low Freq. RF |
SC-RIE-SS12-4-LF |
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16" Al.
Chamber, w/2 AFC's , Low Freq. RF |
SC-RIE-A16-2-LF |
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16" Al.
Chamber, w/4 AFC's, Low Freq. RF |
SC-RIE-A16-4-LF |
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16" SS Chamber,
w/2 AFC's, Low Freq. RF |
SC-RIE-SS16-2-LF |
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16" SS Chamber,
w/4 AFC's, Low Freq. RF |
SC-RIE-SS16-4-LF |
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12" Al.
Chamber, w/2 AFC's , High Freq. RF |
SC-RIE-A12-2-HF |
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12" Al.
Chamber, w/4 AFC's , High Freq. RF |
SC-RIE-A12-4-HF |
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12" SS Chamber,
w/2 AFC's, High Freq. RF |
SC-RIE-SS12-2-HF |
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12" SS Chamber,
w/4 AFC's , High Freq. RF |
SC-RIE-SS12-4-HF |
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16" Al.
Chamber, w/2 AFC's , High Freq. RF |
SC-RIE-A16-2-HF |
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16" Al.
Chamber, w/4 AFC's, High Freq. RF |
SC-RIE-A16-4-HF |
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16" SS Chamber,
w/2 AFC's, High Freq. RF |
SC-RIE-SS16-2-HF |
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16" SS Chamber,
w/4 AFC's, High Freq. RF |
SC-RIE-SS16-4-HF |
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