Sputtering TargetsSemicore offers a wide assortment of sputtering targets and thin film deposition materials that complement our PVD Coating systems satisfying virtually any requirement.

Our sputtering targets come in a wide variety of sizes and materials, including pure elements or compounds and alloys in purities ranging from commercial grade 99.9% purity to the highest, 99.999% zone refined Ultra-Pure grade.

We supply the most commonly requested target shapes - round, rectangular, Ring, ConMag, Quantum, S-Gun – as well as the more conventional sizes. If we do not have the shape you need, we can create a custom sputter targets order for you with any of the materials and purities we carry.

The table below shows the wide range of materials we offer. Please use the link below to request a quote for sputtering targets. If you don't see the material options you are looking for please contact us and our experienced support team will be happy to assist you.

Tell us what vacuum deposition equipment you are using and we can provide you the specifications you need. We supply pure PVD metal targets including gold sputtering targets, titanium-aluminum, vanadium molybdenum and niobium alloy compound targets, rotatable targets as well as small bench top coater targets often used for R&D applications.

We can help you determine the deposition materials you need to match your physical deposition requirements, and can help you formulate the best alloys and compounds to meet your exact thin film coating specifications.

Request A Quote

 

Materials Composition Sputtering
Targets
E-Beam
Sources
Evap.
Mat'ls
Purities
METALS
ALUMINUM Al x x x 99.99- 99.9999%
ANTIMONY Sb x x x 99.999- 99.99999%
ARSENIC As     x 99, 99.999%
BARIUM Ba x   x 99.5%
BERYLLIUM Be x x x 98- 99.9%
BISMUTH Bi x x x 99.9, 99.999%
BORON B   x x 99.5%
CADMIUM Cd x x x 99.999%
CALCIUM Ca     x 99.5%
CARBON C x x x 99.999%
CERIUM Ce x   x 99.9%
CESIUM Cs     x 99.95%
CHROMIUM Cr x x x 99.95%
COBALT Co x x x 99.9%
COPPER Cu x x x 99.99, 99.999%
DYSPROSIUM Dy     x 99.9%
ERBIUM Er     x 99.9%
GADOLINIUM Gd     x 99.9%
GALLIUM Ga     x 99.999, 99.9999%
GERMANIUM Ge x x x 99.999%
GOLD Au x x x 99.99, 99.999%
HAFNIUM Hf x x x 99.9%
HOLMIUM Ho     x 99.9%
INDIUM In x x x 99.99- 99.9999%
IRIDIUM Ir x x x 99.9%
IRON Fe x x x 99.9 99.95%
LANTHANUM La     x 99.9%
LEAD Pb x x x 99.995%
MAGNESIUM Mg x x x 99.95%
MANGANESE Mn x x x 99.9%
MOLYBDENUM Mo x x x 99.95%
NEODYMIUM Nd x x x 99.9%
NICKEL Ni x x x 99.7, 99.995%
NIOBIUM Nb x x x 99.95%
PALLADIUM Pd x x x 99.95%
PLATINUM Pt x x x 99.99%
PRASEODYMIUM Pr x x x 99.9%
RHENIUM Re x x x 99.9%
RUBIDIUM Rb x x x 99.8%
RUTHENIUM Ru x x x 99.9%
SAMARIUM Sm     x 99.9%
SCANDIUM Sc     x 99.9%
SELENIUM Se x x x 99.999- 99.9999%
SILICON Si x x x 99.999%
SILVER Ag x x x 99.99%
STRONTIUM Sr     x 99.5%
TANTALUM Ta x x x 99.95%
TELLURIUM Te x x x 99.999%
TERBIUM Tb     x 99.9%
THALLIUM Tl     x 99.9%
THORIUM Th     x 99.8%
THULIUM Tm     x 99.9%
TIN Sn x x x 99.99%
TITANIUM Ti x x x 99.7- 99.995%
TUNGSTEN W x x x 99.95%
VANADIUM V x x x 99.9%
YTTERBIUM Yb x x x 99.9%
YTTRIUM Y x x x 99.9%
ZINC Zn x x x 99.99, 99.995%
ZIRCONIUM Zr x x x 99.7%
Request A Quote
ALLOYS
ALUMINUM - CHROMIUM (Al)X (Cr)1-X x x x 99.99%
ALUMINUM - COBALT (Al)X (Co)1-X x x x 99.95%
ALUMINUM- COPPER (Al)X (Cu)1-X x x x 99.9- 99.9999%
ALUMINUM - IRON (Al)X (Fe)1-X x x x 99.99%
ALUMINUM - SILICON (Al)X (Si)1-X x x x 99.9- 99.9999%
ALUMINUM - SILICON - COPPER (Al)X (Si)Y (Cu)Z x x x 99.9- 99.9999%
ALUMINUM - TITANIUM (Al)50 (Ti)50 x x x 99.95%
CHROMIUM - SILICON MONOXIDE (Cr)X (SiO)1-X x x x 99.9%
CHROMIUM - NICKEL (Cr)X(Ni)1-X x x x 99.9%
CHROMIUM - COBALT (Cr)X(Co)1-X x x x 99.5%
CHROMIUM - COBALT - NICKEL (Cr)X (Co)Y (Ni)Z x x x 99.5%
COBALT - NICKEL (Co)X(Ni)1-X x x x 99.5%
IRON - NICKEL (PERMALLOY) (Fe)19 (Ni)81 x x x 99.9%
INDIUM - TIN (In)X (Sn)1-X x x x 99.99, 99.999%
NICKEL - VANADIUM (Ni)93 (V)07 x x x 99.95%
TITANIUM - TUNGSTEN (Ti)10 (W)90 x x x 99.99%
TITANIUM - TUNGSTEN (Ti)15 (W)85 x x x 99.99%
Request A Quote
SUPERCONDUCTING ALLOYS
YTTRIUM - BARIUM COPPER OXIDE 1-2-3   x x 99.9- 99.999%
BISMUTH - CALCIUM - STRONTIUM - COPPER OXIDE 2-2-2-3   x x 99.9- 99.999%
BISMUTH - LEAD - CALCIUM - STRONTIUM - COPPER OXIDE 1.94-0.06-2-2-3   x x 99.9- 99.999%
THALLIUM - BARIUM - CALCIUM - COPPER OXIDE 2-2-2-3   x x 99.9- 99.999%
ERBIUM - BARIUM - COPPER OXIDE 1-2-3   x x 99.9- 99.999%
Request A Quote
BORIDES
ALUMINUM BORIDE AlB2 x x x 99%
CHROMIUM BORIDE CrB2 x x x 99.5%
HAFNIUM BORIDE HfB2 x x x 99.5%
LANTHANUM BORIDE LaB6 x x x 99.5%
MOLYBDENUM BORIDE Mo2B5, MoB2 x x x 99.5%
NIOBIUM BORIDE NbB2 x x x 99.5%
TANTALUM BORIDE TaB2 x x x 99.5%
TITANIUM BORIDE TiB2 x x x 99.5%
TUNGSTEN BORIDE WB, W2B x x x 99.5%
VANADIUM BORIDE VB2 x x x 99.5%
ZIRCONIUM BORIDE ZrB2 x x x 99.5%
Request A Quote
CARBIDES
BORON CARBIDE B4C x x x 99.5%
CHROMIUM CARBIDE Cr3C2 x x x 99.5%
HAFNIUM CARBIDE HfC x x x 99.5%
MOLYBDENUM CARBIDE MoC x x x 99.5%
NIOBIUM CARBIDE NbC x x x 99.5%
SILICON CARBIDE SiC x x x 99.5%
TANTALUM CARBIDE TaC x x x 99.5%
TITANIUM CARBIDE TiC x x x 99.5%
TUNGSTEN CARBIDE WC x x x 99.95%
VANADIUM CARBIDE VC x x x 99.5%
ZIRCONIUM CARBIDE ZrC x x x 99.5%
Request A Quote
FLUORIDES
ALUMINUM FLUORIDE AlF3 x x x 99.5%
BARIUM FLUORIDE BaF2 x x x 99.9%
CALCIUM FLUORIDE CaF2 x x x 99.9%
CERIUM FLUORIDE CeF3 x x x 99.9%
LANTHANUM FLUORIDE LaF3 x x x 99.9%
LEAD FLUORIDE PbF2 x x x 99.9%
LITHIUM FLUORIDE LiF x x x 99.9%
MAGNESIUM FLUORIDE MgF2 x x x 99.9%
SODIUM FLUORIDE NaF x x x 99.9%
STRONTIUM FLUORIDE SrF2 x x x 99.9%
THORIUM FLUORIDE ThF4 x x x 99.9%
YTTRIUM FLUORIDE YF3 x x x 99.9%
Request A Quote
NITRIDES
ALUMINUM NITRIDE AlN x x x 99.5%
BORON NITRIDE BN x x x 99.5%
HAFNIUM NITRIDE HfN x x x 99.5%
SILICON NITRIDE Si3N4 x x x 99.9%
TANTALUM NITRIDE TaN x x x 99.5%
TITANIUM NITRIDE TiN x x x 99.5%
VANADIUM NITRIDE VN x x x 99.5%
ZIRCONIUM NITRIDE ZrN x x x 99.5%
Request A Quote
OXIDES
ALUMINUM OXIDE Al2O3 x x x 99.99%
ANTIMONY OXIDE Sb2O3 x x x 99.99%
BARIUM TITANATE BaTiO3 x x x 99.9%
BERYLLIUM OXIDE BeO x x x 99.5%
BISMUTH OXIDE Bi2O3 x x x 99.9%
BISMUTH TITANATE Bi4TiO3 x x x 99.9%
CERIUM OXIDE CeO2 x x x 99.99%
CHROMIUM OXIDE Cr2O3 x x x 99.9%
DYSPROSIUM OXIDE Dy2O3 x x x 99.9%
ERBIUM OXIDE Er2O3 x x x 99.9%
EUROPIUM OXIDE Eu2O3 x x x 99.5%
GALLIUM OXIDE Ga2O3 x x x 99.999%
GERMANIUM OXIDE GeO2 x x x 99.999%
HAFNIUM OXIDE HfO2 x x x 99.9%
HOLMIUM OXIDE Ho2O3 x x x 99.9%
INDIUM OXIDE In2O3 x x x 99.99%
INDIUM TIN OXIDE (In2O3)X (SnO2)1-X x x x 99.99%
IRON OXIDE Fe2O3, Fe2O4 x x x 99.5- 99.9%
LANTHANUM OXIDE La2O3 x x x 99.99%
LEAD TITANATE PbTiO3 x x x 99.9%
MAGNESIUM OXIDE MgO x x x 99.95%
MANGANESE OXIDE MnO, MnO2, Mn2O3 x x x 99.9%
MOLYBDENUM OXIDE MoO2, MoO3 x x x 99.9%
NEODYMIUM OXIDE Nd2O3 x x x 99.9%
NICKEL OXIDE NiO x x x 99.9%
NIOBIUM OXIDE Nb2O5 x x x 99.95%
PRASEODYMIUM OXIDE Pr2O3 x x x 99.9%
SAMARIUM OXIDE Sm2O3 x x x 99.9%
SILICON DIOXIDE SiO2 x x x 99.995%
SILICON MONOXIDE SiO x x x 99.9%
STRONTIUM OXIDE SrO x x x 99.5%
STRONTIUM TITANATE SrTiO3 x x x 99.9%
TANTALUM OXIDE Ta2O5 x x x 99.9%
THORIUM OXIDE ThO2 x x x 99.9%
TIN OXIDE SnO2 x x x 99.9%
TIN OXIDE - ANTIMONY OXIDE SnO2 - Sb2O3 x x x 99.9%
TITANIUM OXIDE TiO2, Ti2O3 x x x 99.9%
TUNGSTEN OXIDE WO3 x x x 99.9%
YTTRIUM OXIDE Y2O3 x x x 99.9%
ZINC OXIDE ZnO x x x 99.9, 99.99%
ZIRCONIUM OXIDE ZrO2 x x x 99.9%
Request A Quote
SELENIDES
CADMIUM SELENIDE CdSe x x x 99.995%
LEAD SELENIDE PbSe x x x 99.95%
MOLYBDENUM SELENIDE MoSe2 x x x 99.9%
NIOBIUM SELENIDE NbSe2 x x x 99.8%
TANTALUM SELENIDE TaSe x x x 99.4%
TUNGSTEN SELENIDE WSe2 x x x 99.8%
ZINC SELENIDE ZnSe x x x 99.9%
Request A Quote
SILICIDES
ALUMINUM SILICIDE AlSi2 x x x 99.5%
CHROMIUM SILICIDE CrSi2, Cr3Si x x x 99.5%
COBALT SILICIDE CiSi2 x x x 99.5%
HAFNIUM SILICIDE HfSi2 x x x 99.5%
IRON SILICIDE FeSi2 x x x 99.5%
MOLYBDENUM SILICIDE MoSi2 x x x 99.5%
NIOBIUM SILICIDE NbSi2 x x x 99.5%
TANTALUM SILICIDE TaSi2, TaSi3 x x x 99.5%
TITANIUM SILICIDE Ti5Si2, TaSi3 x x x 99.9%
TUNGSTEN SILICIDE WSi2 x x x 99.9%
VANADIUM SILICIDE VSi2, V3Si x x x 99.5%
ZIRCONIUM SILICIDE ZrSi2 x x x 99.5%
Request A Quote
SULFIDES
ARSENIC SULFIDE As2S3 x x x 99.9%
CADMIUM SULFIDE CdS x x x 99.99%
INDIUM SULFIDE In2S3 x x x 99.99%
LEAD SULFIDE PbS x x x 99.9%
MOLYBDENUM SULFIDE MoS2 x x x 99%
TANTALUM SULFIDE TaS2 x x x 99.9%
TUNGSTEN SULFIDE WS2 x x x 99.8%
ZINC SULFIDE ZnS x x x 99.99%
ZIRCONIUM SULFIDE ZrS2 x x x 99.9%
Request A Quote
TELLURIDES
CADMIUM TELLURIDE CdTe x x x 99.99%
LEAD TELLURIDE PbTe x x x 99.99%
MOLYBDENUM TELLURIDE MoTe2 x x x 99.9%
NIOBIUM TELLURIDE NbTe2 x x x 99.8%
TANTALUM TELLURIDE TaTe2 x x x 99.8%
TUNGSTEN TELLURIDE WTe2 x x x 99.8%
ZINC TELLURIDE ZnTe x x x 99.99%

 

Sputtering is the thin film deposition manufacturing process at the heart of today’s semiconductors, disk drives, CDs, photovoltaics, flat panel displays, and optical devices.

 

Semicore Equipment, Inc. is a leading worldwide supplier of sputtering equipment for the electronics, optical, solar energy, medical, automotive, military and related high technology industries. Please allow our support staff to answer any questions you have regarding how to implement the best equipment and techniques for your specific sputtering target needs by contacting us at sales@semicore.com or calling 925-373-8201.

 

News and Articles

 

Thin Film Deposition Ionic GlowThin Film Deposition By Sputtering: Essential Basics

There are several forms of Thin Film Deposition which is a vacuum technology for applying coatings of pure materials to the surface of various objects. The coatings are usually in the thickness range of angstroms to microns and can be a single material, or multiple materials in a layered structure... Read More

 

 

RF SputteringWhat is RF Sputtering?

RF or Radio Frequency Sputtering is the technique involved in alternating the electrical potential of the current in the vacuum environment at radio frequencies to avoid a charge building up on certain types of sputtering target materials, which over time can stop the discharge of sputtering atoms terminating the sputtering process. .... Read More

 

 

Pulsed DCWhat is Pulsed DC Sputtering?

Compared to conventional DC Sputtering, arcing can be greatly decreased or even eliminated by pulsing the DC voltage in the 10–350 kHz range with duty cycles in the 50–90% range.  A Pulsed DC electrical current typically in the few hundreds of volts range is applied to the target coating material. The voltage is either turned off or more frequently reversed with a low voltage short duration cycle to "cleanse" the target of any charge buildup. .... Read More

  

Reactive Sputter EquipmentWhat is Reactive Sputtering?

Reactive Sputtering is the process of adding a gas like Oxygen or Nitrogen to the vacuum chamber that undergoes a chemical reaction with the coating material before being deposited as a thin film on a substrate.. .... Read More

 

 

 

 

Semicore Equipment, Inc can supply all your Sputter Target needs!