Linear Magnetron Sputtering

  • Magnetron Sputtering Systems - linearBroader SolutionsFor those who have to coat extremely broad substrates or have to achieve extremely high throughput, linear magnetron sputtering systems offer the perfect solution.
  • AdvantagesSemicore’s linear magnetrons in corporate our fully-encapsulated profiled NdFeB rare earth magnets and turbulent water flow to provide unparalleled performance.
  • Standard FittingsWe use ISO NW standard fittings, as well as Conflat® metal seal flanges. All utilities are maintained at atmosphere and accessed through standard O-ring compression fittings for easy installation in any vacuum system.
  • Total Power CompatibilityLow-impedance heads provide DC Magnetron Sputtering, RF Sputtering, mid-frequency DC, pulsed DC, and microwave power compatibility.
  • Proven PerformanceStandard operation at extremely low pressure and exceptionally high power, provides you with the perfect balance of uniformity, utilization and rate in any application.
  • Typical Cathode LengthsSemicore’s linear cathodes are available in a full range of target widths from 1.5″ to 10″ and lengths up to 8 feet.

Whatever your needs in DC Magnetron Sputtering, RF Sputtering, mid-frequency DC, or pulsed DC Magnetron Sputtering equipment, Semicore is here to help you!


Planar Magnetrons In PVD Coatings: Essential Basics

The Planar Magnetron is, in essence, a classic “diode” mode sputtering cathode with the addition of a permanent magnet array behind the cathode. This magnet array is arranged so that the magnetic field is normal to the electric field in a closed path and forms a boundary “tunnel” which traps electrons near the surface of the target. This electron trapping improves the efficiency of gas ion formation and constrains the discharge plasma, allowing higher current at lower gas pressure and achieves a higher sputter deposition rate for PVD (Physical Vapor Deposition) coatings… Read More


Confocal Cathode Sputtering

Confocal sputtering is the technique of arranging magnetrons within a vacuum chamber in such a way that multiple materials can be applied onto the substrate without breaking vacuum. Confocal sputtering also allows the user to co-sputter, or to create a film of two or more materials at once… Read More