Confocal Cathode Sputtering
An introduction to the confocal method of magnetron sputtering that allows serial and co-sputtering of materials in the production of thin films.
Confocal sputtering is the technique of arranging magnetrons within a vacuum chamber in such a way that multiple materials can be applied onto the substrate without breaking vacuum. Confocal sputtering also allows the user to co-sputter, or to create a film of two or more materials at once. This method is popular for research and development tools and for small scale batch productions.
BENEFITS OF CONFOCAL SPUTTERING
For conventional top down sputtering, only one material will be able to be sputtered at a time. This is because of the geometric relation that the magnetron has with the substrate. Generally when sputtering in this way, the target material must be larger than the substrate to yield acceptable film uniformity. …